Cyclic Deformation of TiNi Shape Memory Alloy
نویسندگان
چکیده
منابع مشابه
Deformation Properties of TiNi Shape Memory Alloy
In order to describe the deformation properties due to the martensitic transformation and the R-phase transformation of TiNi shape memory alloy, a thermomechanical constitutive equation considering the volume fractions of induced phases associated with both transformations is developed. The proposed constitutive equation expresses well the properties of the shape memory effect, pseudoelasticity...
متن کاملThermomechanical Properties of TiNi Shape Memory Alloy
The thermomechanical properties of shape memory effect and superelasticity due to the martensitic transformation and the R-phase transformation of TiNi shape memory alloy were investigated experimentally. The transformation line, recovery stress and fatigue property due to both transformations were discussed for cyclic deformation. The thermomechanical properties due to the R-phase transformati...
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A new kind of biomedical shape memory TiNiAg alloy with antibacterial function was successfully developed in the present study by the introduction of pure Ag precipitates into the TiNi matrix phase. The microstructure, mechanical property, corrosion resistance, ion release behavior in simulated body fluid, cytotoxicity and antibacterial properties were systematically investigated. The typical m...
متن کاملTransformation-Induced Relaxation and Stress Recovery of TiNi Shape Memory Alloy
The transformation-induced stress relaxation and stress recovery of TiNi shape memory alloy (SMA) in stress-controlled subloop loading were investigated based on the local variation in temperature and transformation band on the surface of the tape in the tension test. The results obtained are summarized as follows. (1) In the loading process, temperature increases due to the exothermic martensi...
متن کاملResidual Stress of TiNi Shape Memory Alloy Thin Films with (111) Single-crystal Silicon Wafer
As micro-actuator materials, TiNi shape memory alloy thin films with substrate are used more and more in MEMS field. The residual stress in Ti-rich TiNi thin films with silicon substrate prepared by the magnetron-sputtering technique is measured by both X-ray glancing and contour method. The influence of crystallization annealing temperature and film thickness on the residual stress is tested. ...
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ژورنال
عنوان ژورنال: JSME international journal. Ser. A, Mechanics and material engineering
سال: 1995
ISSN: 1340-8046
DOI: 10.1299/jsmea1993.38.1_59